My Cart
You have no items in your shopping cart.
Compare Products
You have no items to compare.
Product Description
With a high concentration of active ingredients such as: Glycolic Acid, Zinc Oxide, Sulfur, and Camphor, this mask delivers healing, soothing, purifying, and tightening benefits. It works as an antiseptic and serves as a bacteria suppressor.
Additional Information
| How To Use | After cleansing and toning, blot the skin dry and apply the Problematic Skin Care Cream. Follow with a thin layer of this mask all over your face and neck, half an inch away from the eyes and leave on for 10 minutes. Rinse with cool water and apply the Problematic Skin Lotion, followed by the Problematic Skin Cream. Use once or twice a week. |
|---|---|
| Key Ingredients | Bentonite; Zinc Oxide; Glycolic Acid; Salicylic Acid; Aloe |
| More About Pevonia | Pevonia Botanica has the ideal regime to keep your skin looking youthful and radiant. Pevonia Botanica offers a complete line of skin care products containing the most potent and effective, natural source ingredients incorporated within technologically advanced formulae and treatments, delivering you remarkable, highly visible results. All formulae are proven non-comedogenic, contain no mineral oil, lanolin, artificial fragrances, artificial colours or alcohol and are non-animal tested. Pevonia Botanica ensures your beauty needs are specifically, reputably and reliably fulfilled. Pevonia’s formulations and technologies constantly evolve and progress parallel to your skin care concerns and the world’s scientific developments. |
